Photoresist for Single Layer Lift-off Processing (NPR Series)
In the recent rapid progress of manufacturing ultra-fine semiconductors and flat panels, the processes are increasingly diversified. The ability to rapidly develop suitable materials is needed. We are developing a characteristic photoresists (photosensitive materials) for lift-off processing. Lift-off processing has the advantage of eliminating a metal etching process for wiring, thus contributing to shortening the process time and reducing the amount of material used. We also offer consultation on material development to meet our customers’ individual needs and detailed requirements. Contact us for more information.