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Nagase and subsidiary company Nagase ChemteX have jointly
developed a coating agent for zirconium thin film manufacturing,
innovated based on a new molecular precursor metal oxide thin
film process. Compared to the conventional sol-gel method,
this process enables stable film to be produced much easily.
The molecular precursor method for producing metal oxide
films with a chemical solution was co-developed by the two
Nagase firms in conjunction with Sato Mitsufumi, Assistant
Professor of Kogakuin University and Nishide Riichi, Professor
of Nippon University. The conventional method of producing
thin film of this type with solution adopts the Sol-gel technique;
the new process requires only two steps i.e. coating and heating.
When used together with Nagase's EOLEAD Z-661B coating solution,
the result is a transparent, crack-free and homogeneous zirconium
thin film.
The new coating solution for zirconium film follows Nagase's
EOLEAD T-199B for production of titanium film. Both of these
solutions enable more stable production, least affected by
moisture than the Sol-gel method. Another advantage is that
one is able to rinse off the solution after coating, film
is recoverable for reuse before heating. Zirconium film is
suited to a wide range of substrates such as glass, metal
and ceramic due to its superior strength, abrasion and heat
resistance.
The Nagase firms will be developing the new thin film technology
and coating solutions in tandem. Nagase ChemteX will be cultivating
demand, producing solution for sale at a sampling price of
50,000 yen per kilogram. Nagase also plans to engage the new
product directly in thin film manufacturing, and is considering
other practical applications in electrical components, light
fixtures, automobile parts, displays, building materials,
catalysts, tableware and stone for construction.
Nagase is targeting domestic sales of 2 to 3 billion yen
by the end of five years from production and sale of the solution
by Nagase ChemteX as well as consumption in Nagase's own businesses
and fabrication.
(Source: The Chemical Daily)
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